Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

Shuyong Tan; Xuhai Zhang; Xiangjun Wu; Feng Fang; Jianqing Jiang

doi:10.1016/j.tsf.2010.10.067

ScienceGate Book Chapters

JOURNAL ARTICLE

Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

Shuyong Tan Xuhai Zhang Xiangjun Wu Feng Fang Jianqing Jiang

Year: 2010 Journal: Thin Solid Films Vol: 519 (7)Pages: 2116-2120 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2010.10.067

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Chromium nitride Sputter deposition Sputtering Metallurgy Nitride Microstructure Coating Chromium Cavity magnetron Pulsed DC Deposition (geology) Substrate (aquarium) Physical vapor deposition Thin film Composite material Layer (electronics) Nanotechnology

Metrics

Cited By

3.86

FWCI (Field Weighted Citation Impact)

Refs

0.92

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

Metrics

Citation History

Topics

Related Documents

Stress and structure profiles for chromium nitride coatings deposited by r.f. magnetron sputtering

Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering

Magnetron Co-Sputtering of Nanostructured Chromium Aluminium Nitride Coatings

Magnetron Co-Sputtering of Nanostructured Chromium Aluminium Nitride Coatings

Titanium Nitride - Silicon Nitride Composite Coatings Deposited by Reactive Magnetron Sputtering