Electrical resistance-strain characteristics and structure of amorphous Ni-Si-B thin films

Abstract

The strain coefficient y and temperature coefficient of electrical resistance (TCR) and resistance stability of amorphous alloy Ni-Si-B films have been measured. These characteristics are related to the thickness of the film. The structure of the films have been examined by electron microscope. The results are discussed on the basis of microscopic columnar structure model of amorphous thin film and the Meiksin's Theory for effect of elastic strain on the electrical resistance of thin metal film.