JOURNAL ARTICLE

Scanning tunneling spectroscopy of methyl- and ethyl-terminated Si(111) surfaces

Hongbin YuLauren J. WebbJames R. HeathNathan S. Lewis

Year: 2006 Journal:   Applied Physics Letters Vol: 88 (25)   Publisher: American Institute of Physics

Abstract

Methyl- and ethyl-terminated Si(111) surfaces prepared by a two-step chlorination/alkylation method were characterized by low temperature scanning tunneling spectroscopy (STS). The STS data showed remarkably low levels of midgap states on the CH3- and C2H5-terminated Si surfaces. A large conductance gap relative to the Si band gap was observed for both surfaces as well as for the hydrogen-terminated Si(111) surface. This large gap is ascribed to scanning tunneling microscope tip-induced band bending resulting from a low density of midgap states which avoid pinning of the Fermi levels on these passivated surfaces.

Keywords:
Scanning tunneling microscope Scanning tunneling spectroscopy Band bending Band gap Fermi level Spectroscopy Materials science Quantum tunnelling Silicon Surface states Electrochemical scanning tunneling microscope Condensed matter physics Chemistry Analytical Chemistry (journal) Nanotechnology Optoelectronics Surface (topology) Physics

Metrics

45
Cited By
2.07
FWCI (Field Weighted Citation Impact)
14
Refs
0.87
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Surface and Thin Film Phenomena
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Molecular Junctions and Nanostructures
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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