Metal-insulator-semiconductor capacitors using aluminum Bi2O3 and silicon have been studied for varactor applications. Reactively sputtered Bi2O3 films which under suitable proportions of oxygen and argon and had high resistivity suitable for device applications showed a dielectric constant of 25.
J. ReedZ. FanGuangjun GaoA. BotchkarevH. Morkoç̌
Atanu BagMrinal K. HotaS. MallikC. K. Maiti