Kazuaki HottaMotohiro AraiS. Ito
Abstract Discharge‐excited KrF excimer lasers with wavelength of 248 nm are expected to be useful as a light source for microlithography of 64‐Mbit DRAM. This paper reports on a high‐repetition‐rate UV preionized discharge‐excited KrF excimer laser with a new capacitor‐transfer‐circuit configuration in which peaking capacitors are buried in the wall of the laser vessel. This KrF laser delivers a high efficiency of 4 percent, a high average power of 150 W at 600 Hz, and a high‐repetition rate of 700 Hz. The gas lifetime has been confirmed to exceed 3 × 10 6 shots without a gas purifier. This paper also discusses oscillation efficiency, high‐repetition rate operations and the gas lifetime for KrF excimer lasers with an ultraviolet (UV) automatic preionization and a capacitor‐transfer circuit. It has been confirmed that long gas lifetime and high‐repetition rate have been achieved due to the high oscillation efficiency.
Saburoh SatohNoboru OkamotoKohji KakizakiShigeyuki TakagiKen IshikawaTatumi Goto
Ludolf HerbstI. KlaftThomas J. WenzelUlrich Rebhan
Shigeyuki TakagiKouji KakizakiNoboru OkamotoF. EndoK IshikawaTatsumi Goto
Tsutomu KakunoTatsuo EnamiKouji Kakizaki