Mao‐Jung HuangChii-Rong YangRong-Tsong LeeYuang-Cherng Chiou
The study presents a combination of self-assembled nanosphere lithography (SANL) and photo-assisted electrochemical etching (PAECE) to cost-effectively form an arrayed nanostructure on the silicon wafer. The aspect ratio of the pores in this nanoarray fabricated through PAECE is around 22:1. Tuning the etching voltage can convert the nanopore array to a nanopillar array with an aspect ratio of about 20:1. Finally, a two-staged PAECE is used to produce a nanopillar arrays for the production of fuel cell electrodes. Its reaction current of 10.2 mA is 72.9 times higher than that obtained by a planar electrode.
A.C. PeixotoAlexandre Ferreira da SilvaN. S. DiasJ. H. Correia
Yangyang HuDi ZhuNingsong QuYongbin ZengPingmei Ming
Nagwa Mejid ElsitiM.Y. NoordinAdam Umar Alkali
Jing-Yu HoKang J. ChangGou‐Jen Wang
Pierre ToudretMarie HeitzmannJ. BlachotArnaud Morin