C. L. TsaiChia‐Fu ChenChien‐Liang Lin
We synthesized phosphorus-doped and boron-doped emitters by using trimethylphosphite P(OCH3)3 and trimethylborate B(OCH3)3 as doping sources in a microwave plasma chemical vapor deposition system. Based on our experimental results from scanning electron microscopy and Raman spectra, there is much difference among undoped, phosphorus-doped, and boron-doped diamondlike material. In addition, doping both phosphorus and boron can enhance electric properties by reducing the turn-on voltage and can increase the emission current density. The turn-on voltages of undoped, boron-doped, and phosphorus-doped emitters in triode-type field emitter arrays are 15, 8, and 5 V, respectively. The emission currents of boron-doped and phosphorus-doped emitters are about 20 and 80 times larger than the undoped.
T.K. KuS. H. ChenChien-Chih YangNian‐Zu SheF. G. TarntairChi‐Chih WangChilai ChenI−Ta HsiehHua Cheng
Xiaoju LiL.L. HeY.S. LiQ. YangAkira Hirose
Joon Hyung BaePhan Ngoc MinhTakahito OnoMasayoshi Esashi
N TatsumiAkihiko UedaK. TanizakiYoshiki NishibayashiTakahiro Imai
Joon Hyung BaePhan Ngoc MinhTakahito OnoM. Esashi