Plasma-induced surface textures of ZnO:Al transparent conductive films

Qingjun Jiang; Jianguo Lü; Zhizhen Ye

doi:10.1016/j.vacuum.2014.09.016

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Plasma-induced surface textures of ZnO:Al transparent conductive films

Qingjun Jiang Jianguo Lü Zhizhen Ye

Year: 2014 Journal: Vacuum Vol: 111 Pages: 42-47 Publisher: Elsevier BV

DOI: 10.1016/j.vacuum.2014.09.016

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Keywords:

Materials science Plasma Passivation Etching (microfabrication) Texture (cosmology) Mean free path Crystallinity Plasma etching Electrical resistivity and conductivity Hydrogen Analytical Chemistry (journal) Transmittance Scattering Layer (electronics) Optoelectronics Composite material Optics Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Advanced Sensor and Energy Harvesting Materials

Physical Sciences → Engineering → Biomedical Engineering

Plasma-induced surface textures of ZnO:Al transparent conductive films

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