Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet

Yasutaka Ando; Yoshimasa Noda; Akira Kobayashi

doi:10.1016/j.vacuum.2014.07.002

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Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet

Yasutaka Ando Yoshimasa Noda Akira Kobayashi

Year: 2014 Journal: Vacuum Vol: 110 Pages: 190-195 Publisher: Elsevier BV

DOI: 10.1016/j.vacuum.2014.07.002

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Keywords:

Vortex Deposition (geology) Titanium oxide Titanium Plasma Materials science Jet (fluid) Catalysis Atmospheric-pressure plasma Oxide Chemical engineering Analytical Chemistry (journal) Chemistry Environmental chemistry Metallurgy Geology Meteorology Physics Mechanics Nuclear physics Geomorphology Organic chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet

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