JOURNAL ARTICLE

Time-resolved photoluminescence study of hydrogenated amorphous silicon nitride

Kwang Soo SeolTakashi WatanabeMakoto FujimakiHiromitsu KatoYoshimichi OhkiMakoto Takiyama

Year: 2000 Journal:   Physical review. B, Condensed matter Vol: 62 (3)Pages: 1532-1535   Publisher: American Physical Society

Abstract

Time-resolved measurements of photoluminescence were carried out on a hydrogenated amorphous silicon nitride film prepared by low-pressure chemical vapor deposition. When excited with 5.0-eV photons, photoluminescence occurs over a broad spectrum ranging from 1.8 to 3.6 eV. The peak energy of this photoluminescence varies with time from several nanoseconds to nearly 1 ms. These results are explained by a combination of an excitonlike recombination process and a radiative tunneling recombination process of photogenerated carriers within the band-tail states, which are affected by the contributions of thermalization, the Coulombic interaction, and the extent of localization.

Keywords:
Photoluminescence Materials science Thermalisation Amorphous solid Excited state Silicon nitride Chemical vapor deposition Nanosecond Quantum tunnelling Nitride Silicon Optoelectronics Atomic physics Molecular physics Optics Nanotechnology Physics Chemistry Laser Crystallography

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2.64
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21
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0.90
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Citation History

Topics

Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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