Porosity and microstructure of plasma deposited TiO2 thin films

Ana Borrás; Juan R. Sánchez‐Valencia; Jesús Garrido-Molinero; Ángel Barranco; Agustín R. González‐Elipe

doi:10.1016/j.micromeso.2008.09.002

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Porosity and microstructure of plasma deposited TiO2 thin films

Ana Borrás Juan R. Sánchez‐Valencia Jesús Garrido-Molinero Ángel Barranco Agustín R. González‐Elipe

Year: 2008 Journal: Microporous and Mesoporous Materials Vol: 118 (1-3)Pages: 314-324 Publisher: Elsevier BV

DOI: 10.1016/j.micromeso.2008.09.002

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Keywords:

Microstructure Adsorption Materials science Quartz crystal microbalance Scanning electron microscope Desorption Porosity Thin film Analytical Chemistry (journal) Chemical engineering Quartz Water vapor Mineralogy Composite material Chemistry Chromatography Nanotechnology Organic chemistry

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Physical Sciences → Materials Science → Materials Chemistry

Surface Modification and Superhydrophobicity

Physical Sciences → Materials Science → Surfaces, Coatings and Films

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Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Porosity and microstructure of plasma deposited TiO2 thin films

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