Abstract

Fabrication of high Q-factor InP-based Photonic Crystal nanobeam cavities is demonstrated by improving ICP etching. We measure Q-factors as high as ~130,000 for passive cavities by integrating them on to SOI wire waveguides. Nanolasers exhibiting low lasing threshold are then obtained using this technology.

Keywords:
Lasing threshold Photonic crystal Materials science Optoelectronics Etching (microfabrication) Fabrication Q factor Silicon on insulator Laser Optics Photonics Crystal (programming language) Resonator Silicon Nanotechnology Physics

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Citation History

Topics

Photonic Crystals and Applications
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Plasmonic and Surface Plasmon Research
Physical Sciences →  Engineering →  Biomedical Engineering
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