Excimer laser induced chlorine etching of Si patterns for microelectronics

H. Baumgärtner; Wei‐Teh Jiang; I. Eisele

doi:10.1016/s0169-4332(96)00386-8

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Excimer laser induced chlorine etching of Si patterns for microelectronics

H. Baumgärtner Wei‐Teh Jiang I. Eisele

Year: 1996 Journal: Applied Surface Science Vol: 106 Pages: 301-305 Publisher: Elsevier BV

DOI: 10.1016/s0169-4332(96)00386-8

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Keywords:

Fluence Etching (microfabrication) Excimer laser Microelectronics Laser Materials science Chlorine Isotropic etching Analytical Chemistry (journal) Optoelectronics Optics Chemistry Nanotechnology Metallurgy Layer (electronics)

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Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Laser-induced spectroscopy and plasma

Physical Sciences → Engineering → Mechanics of Materials

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Excimer laser induced chlorine etching of Si patterns for microelectronics

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