Highly (001)-oriented α-Al2O3 films prepared by laser chemical vapor deposition

Yu You; Akihiko Ito; Takashi Goto

doi:10.1016/j.matlet.2013.04.113

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Highly (001)-oriented α-Al2O3 films prepared by laser chemical vapor deposition

Yu You Akihiko Ito Takashi Goto

Year: 2013 Journal: Materials Letters Vol: 106 Pages: 11-13 Publisher: Elsevier BV

DOI: 10.1016/j.matlet.2013.04.113

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Keywords:

Materials science Crystallite Chemical vapor deposition Deposition (geology) Combustion chemical vapor deposition Vaporization Hexagonal crystal system Pulsed laser deposition Thin film Ion plating Hybrid physical-chemical vapor deposition Chemical engineering Composite material Carbon film Nanotechnology Crystallography Metallurgy Chemistry Organic chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Highly (001)-oriented α-Al2O3 films prepared by laser chemical vapor deposition

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