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JOURNAL ARTICLE

Properties of rf‐sputtered beryllium thin films

W. M. PaulsonR. P. Lorigan

Year: 1977 Journal:   Journal of Vacuum Science and Technology Vol: 14 (1)Pages: 210-218   Publisher: American Institute of Physics
DOI: 10.1116/1.569124
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Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation W. M. Paulson, R. P. Lorigan; Properties of rf‐sputtered beryllium thin films. J. Vac. Sci. Technol. 1 January 1977; 14 (1): 210–218. https://doi.org/10.1116/1.569124 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search

Keywords:
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Topics

Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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