Properties of zirconia thin films prepared by reactive magnetron sputtering

K.P.S.S. Hembram; G. Mohan Rao

doi:10.1016/j.matlet.2006.04.108

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Properties of zirconia thin films prepared by reactive magnetron sputtering

K.P.S.S. Hembram G. Mohan Rao

Year: 2006 Journal: Materials Letters Vol: 61 (2)Pages: 502-505 Publisher: Elsevier BV

DOI: 10.1016/j.matlet.2006.04.108

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Keywords:

Materials science Cubic zirconia Sputtering Thin film Sputter deposition Cavity magnetron High-power impulse magnetron sputtering Composite material Chemical engineering Metallurgy Engineering physics Ceramic Nanotechnology

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Properties of zirconia thin films prepared by reactive magnetron sputtering

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