High entropy alloy thin films deposited by magnetron sputtering of powder targets

B.R. Braeckman; Francis Boydens; H. Hidalgo; Perrine Dutheil; Maud Jullien; A.L. Thomann; Diederik Depla

doi:10.1016/j.tsf.2015.02.070

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High entropy alloy thin films deposited by magnetron sputtering of powder targets

B.R. Braeckman Francis Boydens H. Hidalgo Perrine Dutheil Maud Jullien A.L. Thomann Diederik Depla

Year: 2015 Journal: Thin Solid Films Vol: 580 Pages: 71-76 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2015.02.070

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Keywords:

Alloy Sputter deposition Materials science Thin film Sputtering High entropy alloys Crystallography Crystal structure Scanning electron microscope Cavity magnetron Solid solution X-ray photoelectron spectroscopy Energy-dispersive X-ray spectroscopy Cubic crystal system Analytical Chemistry (journal) Metallurgy Chemical engineering Chemistry Nanotechnology Composite material

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High Entropy Alloys Studies

Physical Sciences → Engineering → Mechanical Engineering

High-Temperature Coating Behaviors

Physical Sciences → Engineering → Aerospace Engineering

Advanced materials and composites

Physical Sciences → Engineering → Mechanical Engineering

High entropy alloy thin films deposited by magnetron sputtering of powder targets

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