JOURNAL ARTICLE

Polaron absorption in amorphous tungsten oxide films

Lars BerggrenA. AzensGunnar A. Niklasson

Year: 2001 Journal:   Journal of Applied Physics Vol: 90 (4)Pages: 1860-1863   Publisher: American Institute of Physics

Abstract

Amorphous thin films of tungsten oxide were deposited by sputtering onto glass substrates covered by conductive indium–tin oxide. The density and stoichiometry were determined by Rutherford backscattering spectrometry. Lithium ions were intercalated electrochemically into the films. The optical reflectance and transmittance were measured in the wavelength range from 0.3 to 2.5 μm, at a number of intercalation levels. The polaron absorption peak becomes more symmetric and shifts to higher energies until an intercalation level of 0.25 to 0.3 Li+/W, where a saturation occurs. The shape of the polaron peak is in very good agreement with the theory of Bryksin [Fiz. Tverd. Tela 24, 1110 (1982)]. Within this model, the shift of the absorption peak is interpreted as an increase in the Fermi level of the material as more Li ions are inserted.

Keywords:
Polaron Materials science Tungsten Amorphous solid Analytical Chemistry (journal) Sputtering Indium tin oxide Absorption edge Oxide Transmittance Fermi level Absorption (acoustics) Thin film Chemistry Crystallography Optoelectronics Band gap Nanotechnology Physics

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Citation History

Topics

Transition Metal Oxide Nanomaterials
Physical Sciences →  Materials Science →  Polymers and Plastics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Ga2O3 and related materials
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials

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