JOURNAL ARTICLE

Hydrogenated aluminum nitride thin films prepared by r.f. reactive sputtering. Infrared and structural properties

J.C. LoretzBernard DespaxPatrick MartiA. Mazel

Year: 1995 Journal:   Thin Solid Films Vol: 265 (1-2)Pages: 15-21   Publisher: Elsevier BV
Keywords:
Fourier transform infrared spectroscopy Sputtering Analytical Chemistry (journal) Nitride Thin film Materials science Spectroscopy Infrared spectroscopy Argon Aluminium Infrared Chemistry Layer (electronics) Chemical engineering Optics Metallurgy Nanotechnology

Metrics

23
Cited By
1.13
FWCI (Field Weighted Citation Impact)
24
Refs
0.78
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Acoustic Wave Resonator Technologies
Physical Sciences →  Engineering →  Biomedical Engineering
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry

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