JOURNAL ARTICLE

Temperature dependence of reactive ion beam etching of GaAs with CH4/H2

Keywords:
Activation energy Atmospheric temperature range Etching (microfabrication) Hydrogen Chemistry Reactive-ion etching Ion Ion beam Analytical Chemistry (journal) Range (aeronautics) Adduct Methane Materials science Physical chemistry Organic chemistry Thermodynamics

Metrics

3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
9
Refs
0.19
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Ion-surface interactions and analysis
Physical Sciences →  Engineering →  Computational Mechanics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials

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