Bulge testing and fracture properties of plasma-enhanced chemical vapor deposited silicon nitride thin films

Wei Zhou; Jinling Yang; Yan Li; An Ji; Fuhua Yang; Yude Yu

doi:10.1016/j.tsf.2008.10.042

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Bulge testing and fracture properties of plasma-enhanced chemical vapor deposited silicon nitride thin films

Wei Zhou Jinling Yang Yan Li An Ji Fuhua Yang Yude Yu

Year: 2008 Journal: Thin Solid Films Vol: 517 (6)Pages: 1989-1994 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2008.10.042

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Keywords:

Materials science Silicon nitride Thin film Composite material Substrate (aquarium) Chemical vapor deposition Silicon Nitride Plasma-enhanced chemical vapor deposition Optoelectronics Nanotechnology Layer (electronics)

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Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Numerical methods in engineering

Physical Sciences → Engineering → Mechanics of Materials

Bulge testing and fracture properties of plasma-enhanced chemical vapor deposited silicon nitride thin films

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