JOURNAL ARTICLE

Process monitoring during AlN deposition by reactive magnetron sputtering

Juan AcostaA. RojoO. SalasJ. Oseguera

Year: 2007 Journal:   Surface and Coatings Technology Vol: 201 (18)Pages: 7992-7999   Publisher: Elsevier BV
Keywords:
X-ray photoelectron spectroscopy Materials science Scanning electron microscope Analytical Chemistry (journal) Sputter deposition Cavity magnetron Deposition (geology) Sputtering Spectroscopy Energy-dispersive X-ray spectroscopy Thin film Chemical engineering Composite material Nanotechnology Chemistry Chromatography

Metrics

27
Cited By
3.36
FWCI (Field Weighted Citation Impact)
14
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials

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