Structure and mechanical properties of Ti–Al films deposited by magnetron sputtering

J.C. Oliveira; A. Manaia; J.P. Dias; A. Cavaleiro; D.G. Teer; Stuart Taylor

doi:10.1016/j.surfcoat.2005.01.078

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Structure and mechanical properties of Ti–Al films deposited by magnetron sputtering

J.C. Oliveira A. Manaia J.P. Dias A. Cavaleiro D.G. Teer Stuart Taylor

Year: 2005 Journal: Surface and Coatings Technology Vol: 200 (1-4)Pages: 395-398 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2005.01.078

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Keywords:

Materials science Diffraction Sputter deposition Sputtering Aluminium Analytical Chemistry (journal) Titanium Thin film Phase (matter) X-ray crystallography Crystallography Metallurgy Composite material Optics Nanotechnology Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Intermetallics and Advanced Alloy Properties

Physical Sciences → Engineering → Mechanical Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Structure and mechanical properties of Ti–Al films deposited by magnetron sputtering

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