JOURNAL ARTICLE

Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor

O.R. MonteiroZhi WangI.G. Brown

Year: 1996 Journal:   Journal of Materials Science Vol: 31 (22)Pages: 6029-6033   Publisher: Springer Science+Business Media
Keywords:
Materials science Silicon nitride Silicon Chemical vapor deposition Methane Plasma-enhanced chemical vapor deposition Wafer Chemical engineering Deposition (geology) Analytical Chemistry (journal) Inorganic chemistry Nanotechnology Chemistry Organic chemistry Metallurgy

Metrics

3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
14
Refs
0.13
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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