JOURNAL ARTICLE
Chemical vapour deposition of silicon nitride in a microwave plasma assisted reactor
O.R. MonteiroZhi WangI.G. Brown
Year: 1996 Journal: Journal of Materials Science Vol: 31 (22)Pages: 6029-6033 Publisher: Springer Science+Business Media
Keywords:
Materials science Silicon nitride Silicon Chemical vapor deposition Methane Plasma-enhanced chemical vapor deposition Wafer Chemical engineering Deposition (geology) Analytical Chemistry (journal) Inorganic chemistry Nanotechnology Chemistry Organic chemistry Metallurgy
Metrics
3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
14
Refs
0.13
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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