JOURNAL ARTICLE
Pt oxidation at 480 K under vacuum conditions
G. PirugR. DziembajH.P. Bonzel
Year: 1989 Journal: Surface Science Vol: 221 (3)Pages: 553-564 Publisher: Elsevier BV
Keywords:
Annealing (glass) Oxide Chemistry Photoemission spectroscopy Binding energy Physical chemistry X-ray photoelectron spectroscopy Analytical Chemistry (journal) Inorganic chemistry Crystallography Materials science Chemical engineering Atomic physics Metallurgy Organic chemistry
Metrics
8
Cited By
1.30
FWCI (Field Weighted Citation Impact)
24
Refs
0.77
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Electron and X-Ray Spectroscopy Techniques
Physical Sciences → Materials Science → Surfaces, Coatings and Films
Advanced Materials Characterization Techniques
Physical Sciences → Engineering → Biomedical Engineering
Surface and Thin Film Phenomena
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Related Documents
JOURNAL ARTICLE
Pt oxidation at 480 K under vacuum conditions
G. PirugR. DziembajH.P. Bonzel
Journal: Surface Science Letters Year: 1989 Vol: 221 (3)Pages: A516-A516
JOURNAL ARTICLE
Wet oxidation of AlAs films under ultrahigh vacuum conditions
William J. MitchellChan‐Hwa ChungSang I. YiEvelyn L. HuW. H. Weinberg
Journal: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Year: 1997 Vol: 15 (4)Pages: 1182-1186
JOURNAL ARTICLE
LUBRICATION UNDER SPACE/VACUUM CONDITIONS
Journal: Scientific Lubrication Year: 1963 Vol: 15 (3)Pages: 180-202
JOURNAL ARTICLE
Lubrication under space/vacuum conditions
Journal: Wear Year: 1963 Vol: 6 (5)Pages: 409-410