Electrical and optical experimental study of ionized physical vapour deposition (IPVD) processes

Ludovic de Poucques; Jean-Christophe Imbert; C. Boisse-Laporte; J. Bretagne; M. Ganciu; L. Teul’-Gay; M. Touzeau

doi:10.1007/s10582-006-0366-1

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Electrical and optical experimental study of ionized physical vapour deposition (IPVD) processes

Ludovic de Poucques Jean-Christophe Imbert C. Boisse-Laporte J. Bretagne M. Ganciu L. Teul’-Gay M. Touzeau

Year: 2006 Journal: Czechoslovak Journal of Physics Vol: 56 (S2)Pages: B1300-B1313 Publisher: Springer Science+Business Media

DOI: 10.1007/s10582-006-0366-1

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Keywords:

Ambipolar diffusion Langmuir probe Materials science Spectroscopy Plasma Argon Ionization Atomic physics Absorption spectroscopy Absorption (acoustics) Ion Diffusion Pulsed DC Titanium Sputter deposition Plasma diagnostics Cavity magnetron Sputtering Analytical Chemistry (journal) Thin film Optics Chemistry Physics Nanotechnology

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electrical and optical experimental study of ionized physical vapour deposition (IPVD) processes

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