Threshold stress intensity for oxidative crack healing in sintered silicon nitride

Toshio Ogasawara; Toshio Hori; Akira Okada

doi:10.1007/bf00278010

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Threshold stress intensity for oxidative crack healing in sintered silicon nitride

Toshio Ogasawara Toshio Hori Akira Okada

Year: 1994 Journal: Journal of Materials Science Letters Vol: 13 (6)Pages: 404-406 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00278010

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Keywords:

Materials science Silicon nitride Intensity (physics) Nitride Stress intensity factor Composite material Oxidative stress Silicon Stress (linguistics) Materials processing Metallurgy Fracture mechanics Optics Layer (electronics)

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Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Rock Mechanics and Modeling

Physical Sciences → Engineering → Mechanics of Materials

Magnesium Oxide Properties and Applications

Physical Sciences → Materials Science → Materials Chemistry

Threshold stress intensity for oxidative crack healing in sintered silicon nitride

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