Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma

Toshiyuki Hamada; Tatsuya Sakoda; Masahisa Otsubo

doi:10.1007/s11090-009-9170-6

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Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma

Toshiyuki Hamada Tatsuya Sakoda Masahisa Otsubo

Year: 2009 Journal: Plasma Chemistry and Plasma Processing Vol: 29 (3)Pages: 197-204 Publisher: Springer Science+Business Media

DOI: 10.1007/s11090-009-9170-6

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Keywords:

Groove (engineering) Materials science Electrode Atmospheric pressure Silicon Plasma Silicon nitride Etching (microfabrication) Atmospheric-pressure plasma Substrate (aquarium) Plasma cleaning Analytical Chemistry (journal) Plasma etching Composite material Optoelectronics Chemistry Layer (electronics) Metallurgy

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Surface Modification and Superhydrophobicity

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma

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