JOURNAL ARTICLE
Crystallization kinetics of amorphous NiSix films
R. D. ThompsonJ. AngilelloK. N. Tu
Year: 1990 Journal: Thin Solid Films Vol: 188 (2)Pages: 259-265 Publisher: Elsevier BV
Keywords:
Crystallite Kinetics Crystallization Amorphous solid Activation energy Electrical resistivity and conductivity Materials science Crystal growth Crystallography Chemical engineering Mineralogy Thermodynamics Analytical Chemistry (journal) Chemistry Metallurgy Physical chemistry Physics Chromatography
Metrics
6
Cited By
0.21
FWCI (Field Weighted Citation Impact)
4
Refs
0.49
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Semiconductor materials and interfaces
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Chalcogenide Semiconductor Thin Films
Physical Sciences → Engineering → Electrical and Electronic Engineering
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