Formation of diamond and nanocrystalline diamond films by microwave plasma CVD

Mineo Hiramatsu; Chi Hian Lau; Andrew M. R. Bennett; John S. Foord

doi:10.1016/s0040-6090(02)00006-8

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Formation of diamond and nanocrystalline diamond films by microwave plasma CVD

Mineo Hiramatsu Chi Hian Lau Andrew M. R. Bennett John S. Foord

Year: 2002 Journal: Thin Solid Films Vol: 407 (1-2)Pages: 18-25 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(02)00006-8

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Keywords:

Diamond Chemical vapor deposition Field electron emission Materials science Substrate (aquarium) Material properties of diamond Carbon film Silicon Plasma Graphite Plasma-enhanced chemical vapor deposition Nanocrystalline material Chemical engineering Optoelectronics Nanotechnology Thin film Composite material

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Formation of diamond and nanocrystalline diamond films by microwave plasma CVD

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Citation History

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