M. FrickeR. NonningerH. Schmidt
Silicon nitride is used in different applications because of its resistance against thermal shock, igh temperature and mechanical load. An appropriate second phase like TiN could make Si3N4 attractive for additional applications. This work deals with the introduction of a TiN phase from a nanosize TiN powder into the Si3N4 matrix by a single-step wet chemical process.
M. FrickeR. NonningerH. Schmidt
Yu. F. KarginС. Н. ИвичеваА. С. ЛысенковN. A. OvsyannikovЛ. И. ШворневаК. А. Солнцев
Atsushi NakahiraKoichi NiiharaJunn OhkijimaToshi Hirai
Hiroshi WatanabeJunichi TatamiTakeshi MeguroKatsutoshi KomeyaMichiyasu KomatsuAkira Azushima