JOURNAL ARTICLE

Electrical properties of ideal metal contacts to GaAs: Schottky-barrier height

J. R. Waldrop

Year: 1984 Journal:   Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Vol: 2 (3)Pages: 445-448   Publisher: AIP Publishing

Abstract

The electrical properties, with emphasis on Schottky-barrier height φB, of ideal (no interfacial oxide) contacts to GaAs have been measured for a diverse group of 14 metals by using current-voltage and capacitance–voltage methods. The contact interfaces were formed under controlled ultrahigh vacuum conditions by metal evaporation onto clean (100) surfaces of both n-type and p-type GaAs. The range of φB for n-type contacts is 0.96 to 0.62 eV in the decreasing order: Cu, Pd, Ag, Au, Al, Ti, Mn, Pb, Bi, Ni, Cr, Co, Fe, and Mg. For p-type contacts, the φB range is 0.45 to 0.62 eV. No simple correlation is apparent between φB and contact metal work function nor between φB and the metal–GaAs interface chemistry.

Keywords:
Schottky barrier Materials science Metal Oxide Schottky diode Work function Electrical contacts Evaporation Vacuum evaporation Analytical Chemistry (journal) Optoelectronics Nanotechnology Chemistry Thin film Metallurgy Physics

Metrics

142
Cited By
4.20
FWCI (Field Weighted Citation Impact)
0
Refs
0.95
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Molecular Junctions and Nanostructures
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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