JOURNAL ARTICLE

Optical anisotropy of nanostructured silicon films studied by Fourier transform infrared spectroscopy

L. P. KuznetsovaAleksandra EfimovaL. A. GolovanV. Yu. TimoshenkoП. К. Кашкаров

Year: 2002 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 4748 Pages: 350-350   Publisher: SPIE

Abstract

Electrochemically nanostructured Si films with surface orientation (110) prepared at different current density were investigated by Fourier transform infrared spectroscopy. The spectra exhibit beats of interference fringes arisen from the summation of intensities of ordinary and extraordinary waves which interfere in the film. The investigated films are shown to exhibit properties of a negative uniaxial crystal (no > ne) with optical axis lying in the surface plane along [001] direction. The value of birefringence reaches 18% for nanostructured Si films with porosity of 80%. Experimental data agree with calculations based on the effective media approximation for anisotropically spaced Si nanocrystals.

Keywords:
Materials science Birefringence Anisotropy Spectroscopy Fourier transform infrared spectroscopy Silicon Fourier transform Fourier transform spectroscopy Infrared Porous silicon Infrared spectroscopy Optics Crystal (programming language) Analytical Chemistry (journal) Optoelectronics Chemistry Physics

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Topics

Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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