Fabrication for metal photomask pattern by using fountain-pen nanolithography

Miki Onoue; Hirobumi Ushijima

doi:10.1016/j.mee.2009.11.177

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Fabrication for metal photomask pattern by using fountain-pen nanolithography

Miki Onoue Hirobumi Ushijima

Year: 2009 Journal: Microelectronic Engineering Vol: 87 (5-8)Pages: 910-913 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2009.11.177

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Keywords:

Photomask Nanolithography Fountain Fabrication Dip-pen nanolithography Nanotechnology Materials science Lithography Metal Optoelectronics Resist Metallurgy Art Visual arts

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Force Microscopy Techniques and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Fabrication for metal photomask pattern by using fountain-pen nanolithography

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