JOURNAL ARTICLE

Potentiostatic deposition and characterization of Cu2O thin films

T. MahalingamJ.S.P. ChitraS. RajendranP.J. Sebastián

Year: 2002 Journal:   Semiconductor Science and Technology Vol: 17 (6)Pages: 565-569   Publisher: IOP Publishing

Abstract

Semiconducting Cu2O thin films were electrodeposited potentiostatically on Cu and SnO2 substrates. The deposition kinetics of film growth and the conditions to obtain spotty and uniform Cu2O films are studied. X-ray diffraction studies revealed the formation of single phase cubic Cu2O films. The effects of deposition potential, solution pH and bath temperature on the structure are studied. The optical, electrical, composition and morphological analysis are carried out for Cu2O films prepared at various deposition conditions and the results are discussed.

Keywords:
Deposition (geology) Thin film Characterization (materials science) Materials science Diffraction Kinetics Phase (matter) Analytical Chemistry (journal) Chemical engineering Chemistry Mineralogy Nanotechnology Optics Geology Environmental chemistry

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20
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0.68
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Citation History

Topics

Copper-based nanomaterials and applications
Physical Sciences →  Materials Science →  Materials Chemistry
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
Electronic and Structural Properties of Oxides
Physical Sciences →  Materials Science →  Materials Chemistry
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