Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering

Stefan Bruns; Michael Vergöhl

doi:10.1117/12.896838

ScienceGate Book Chapters

JOURNAL ARTICLE

Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering

Stefan Bruns Michael Vergöhl

Year: 2011 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 8168 Pages: 81680N-81680N Publisher: SPIE

DOI: 10.1117/12.896838

Get Full-Text PDF Get Analytical Report

Abstract

Paper 81680N

Keywords:

Materials science Sputtering Thin film Sputter deposition Argon Pulsed DC Cavity magnetron Deposition (geology) Oxide Surface roughness Absorption (acoustics) Analytical Chemistry (journal) Optoelectronics Composite material Metallurgy Nanotechnology Chemistry

Metrics

Cited By

1.21

FWCI (Field Weighted Citation Impact)

Refs

0.80

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering

Abstract

Metrics

Citation History

Topics

Related Documents

Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering

Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering

Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering