Growth of Fe2O3 thin films by atomic layer deposition

Martin Lie; Helmer Fjellvåg; Arne Kjekshus

doi:10.1016/j.tsf.2005.04.063

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Growth of Fe2O3 thin films by atomic layer deposition

Martin Lie Helmer Fjellvåg Arne Kjekshus

Year: 2005 Journal: Thin Solid Films Vol: 488 (1-2)Pages: 74-81 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2005.04.063

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Keywords:

Atomic layer deposition Spinel Thin film Materials science Layer (electronics) Crystal (programming language) Crystal structure Deposition (geology) Chemical engineering Crystallography Analytical Chemistry (journal) Nanotechnology Chemistry Metallurgy Organic chemistry

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Iron oxide chemistry and applications

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Growth of Fe2O3 thin films by atomic layer deposition

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