p-ZnO Thin Films Deposited by RF-Magnetron Sputtering

Abstract

In this work, we study ZnO thin films deposited onto silicon substrate by RF-magnetron sputtering for semiconductor applications. For this, we analyses resistivity, photoconduction, composition and semiconducting characteristics, in these films. The results indicate that the films are nearly stoichiometric, p-type, with relative high resistivity and some samples shown photocurrent when exposed to white light.