JOURNAL ARTICLE

Measurements of deep levels in high-purity molecular beam epitaxial GaAs

R. Y. DejuleM. A. HaaseG. E. StillmanS. C. PalmateerJames C. M. Hwang

Year: 1985 Journal:   Journal of Applied Physics Vol: 57 (12)Pages: 5287-5289   Publisher: American Institute of Physics

Abstract

Constant capacitance deep-level transient spectroscopy measurements are performed on molecular beam epitaxially grown GaAs layers with net carrier concentrations of 3.3–6.5×1014 cm−3. Four trap levels are detected, three of which are usually detected in molecular beam epitaxial layers, and the fourth, a very shallow trap at 30 meV, has not been previously reported. Determination of the concentrations for this new level dispute the accepted interpretation of Hall measurements near and above room temperature.

Keywords:
Molecular beam epitaxy Deep-level transient spectroscopy Molecular beam Epitaxy Hall effect Trap (plumbing) Materials science Beam (structure) Spectroscopy Capacitance Analytical Chemistry (journal) Optoelectronics Chemistry Optics Silicon Molecule Electrical resistivity and conductivity Physics Nanotechnology Physical chemistry Layer (electronics)

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31
Cited By
5.11
FWCI (Field Weighted Citation Impact)
7
Refs
0.96
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Molecular Junctions and Nanostructures
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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