Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Yoshiaki Ishii; Jun Taniguchi

doi:10.1016/j.mee.2007.01.133

ScienceGate Book Chapters

JOURNAL ARTICLE

Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Yoshiaki Ishii Jun Taniguchi

Year: 2007 Journal: Microelectronic Engineering Vol: 84 (5-8)Pages: 912-915 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2007.01.133

Get Full-Text PDF Get Analytical Report

Keywords:

Resist Electron-beam lithography Materials science Acceleration voltage Laser linewidth Nanoimprint lithography Lithography Stencil lithography Mold Fabrication Optics Optoelectronics Voltage Cathode ray Nanotechnology Electron Layer (electronics) Composite material Laser Electrical engineering

Metrics

Cited By

5.27

FWCI (Field Weighted Citation Impact)

Refs

0.95

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Metrics

Citation History

Topics

Related Documents

Three Dimensional Nanoimprint Lithography Using Inorganic Electron Beam Resist

Fabrication of Complex 3D Nanoimprint Mold by Using Acceleration Voltage Electron Beam Lithography

Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake

Large area mold fabrication for the nanoimprint lithography using electron beam lithography

Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography