Preparation of Diamond-Like Carbon Film Assisted in the Plasma of Dielectric Barrier Discharge at Atmospheric Pressure

Abstract

Dielectric barrier discharge at atmospheric presure has been applied to prepare hydrocarbon films on large- area glass and silicon substrates. When hydrogen and methane mixture(2:1) is used as discharge gas and the substrate is heated to 300 °C, hard hydrogenated amorphous carbon film is deposited. From the IR deconvolution analysis of the C-H stretching absorption for the coating, the hydrocarbon group ration (CH3:CH2:CH) and C-C bond type ratio (sp3c/sp2c) are about 10%: 21%: 69% and 3:1–6:1, respectively. Their Knoop hardness is up to 10Gpa. No film is deposited when the content of methane in the mixed gases is decreased to 5% at 300 °C silicon substrate.