JOURNAL ARTICLE

High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas

Keywords:
Etching (microfabrication) Etch pit density Inductively coupled plasma Reactive-ion etching Dry etching Plasma etching Materials science Analytical Chemistry (journal) Copper Plasma Chemistry Nanotechnology Metallurgy Layer (electronics)

Metrics

28
Cited By
0.63
FWCI (Field Weighted Citation Impact)
11
Refs
0.71
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Silicon Carbide Semiconductor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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