JOURNAL ARTICLE
Excimer laser projection photoetching
M. R. LattaR.A. MooreStuart A. RiceKanti Jain
Year: 1984 Journal: Journal of Applied Physics Vol: 56 (2)Pages: 586-588 Publisher: American Institute of Physics
Abstract
Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.
Keywords:
Excimer laser Excimer Optics Materials science Laser Projection (relational algebra) Resist Optoelectronics Nanotechnology Physics Computer science Layer (electronics)
Metrics
23
Cited By
6.23
FWCI (Field Weighted Citation Impact)
2
Refs
0.97
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences → Materials Science → Surfaces, Coatings and Films
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
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