JOURNAL ARTICLE
Ion beam sputter deposition of V2O5 thin films
Tobias GallaschT. StockhoffD. BaitherGuido Schmitz
Year: 2010 Journal: Journal of Power Sources Vol: 196 (1)Pages: 428-435 Publisher: Elsevier BV
Keywords:
Thin film Sputtering Analytical Chemistry (journal) Materials science Vanadium Partial pressure Transmission electron microscopy Annealing (glass) Ion beam Ion beam deposition Sputter deposition Electron energy loss spectroscopy Ion Oxygen Chemistry Nanotechnology Composite material
Metrics
37
Cited By
2.27
FWCI (Field Weighted Citation Impact)
20
Refs
0.86
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Transition Metal Oxide Nanomaterials
Physical Sciences → Materials Science → Polymers and Plastics
ZnO doping and properties
Physical Sciences → Materials Science → Materials Chemistry
Ga2O3 and related materials
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
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