Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering

Pengtao Gao; Lijian Meng; M.P. dos Santos; V. Teixeira; M. Andritschky

doi:10.1016/s0040-6090(00)01395-x

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Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering

Pengtao Gao Lijian Meng M.P. dos Santos V. Teixeira M. Andritschky

Year: 2000 Journal: Thin Solid Films Vol: 377-378 Pages: 32-36 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(00)01395-x

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Keywords:

Crystallite Scanning electron microscope Tetragonal crystal system Raman spectroscopy Microstructure Materials science Sputter deposition Analytical Chemistry (journal) Refractive index Spectroscopy Sputtering Cavity magnetron Thin film Optics Crystallography Chemistry Crystal structure Composite material Optoelectronics Metallurgy Nanotechnology Physics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

High-Temperature Coating Behaviors

Physical Sciences → Engineering → Aerospace Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering

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