JOURNAL ARTICLE

Magnetoresistance in amorphous TbFeCo films with perpendicular magnetic anisotropy

Masudur RahmanXiaoxi LiuM. MatsumotoAkimitsu MorisakoSakae MeguroKoichi Akahane

Year: 2005 Journal:   Journal of Applied Physics Vol: 97 (10)   Publisher: American Institute of Physics

Abstract

The magnetoresistance of TbFeCo amorphous films with perpendicular magnetic anisotropy have been studied at room temperature. TbFeCo films within a thickness range of 50–300nm were deposited by a dc-magnetron sputtering. Sharp change in magnetoresistance (MR) has been found at the magnetization reversal region. The MR ratio is sensitively dependent on the film thickness and the magnetic domain pattern. Films with smaller domain pattern show higher MR ratio. The MR ratio is decreased with the decrease in film thickness. It may be considered that the observed MR is contributed from the domain wall. The maximum MR ratio is about 3.7% for the film with thickness of 300nm at room temperature. No MR has been found when the magnetic field is applied parallel to the film plane.

Keywords:
Materials science Magnetoresistance Amorphous solid Condensed matter physics Film plane Magnetic anisotropy Sputtering Magnetic domain Sputter deposition Magnetization Domain wall (magnetism) Anisotropy Perpendicular Thin film Nuclear magnetic resonance Magnetic field Optics Crystallography Physics Nanotechnology Chemistry

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Citation History

Topics

Magnetic properties of thin films
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Magnetic Properties and Applications
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Metallic Glasses and Amorphous Alloys
Physical Sciences →  Engineering →  Mechanical Engineering
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