Fabrication and Calibration of a Thin Film Heat Flux Sensor

Abstract

In order to measure heat flux in micro scale space, a thin film heat flux sensor is designed, fabricated and calibrated. Vacuum coating technology is applied to fabricate the sensor with a total thickness of 0.49μm. Silicon dioxide wafer is used as substrate. Cobalt and stibium is deposited on the substrate to form thermopile. Correlation coefficient R is 0.94025. Sensitivity of the heat flux sensor is 0.05062 μV/(W/m 2 ). Time constant of the sensor is 0.66044 seconds. Dynamic test shows that the heat flux sensor responds rapidly to periodic heat flux which is supplied by halogen lamp.