JOURNAL ARTICLE

Fabrication of Free-Standing Nanoscale Alumina Membranes with Controllable Pore Aspect Ratios

Chee-Seng TohBrendan M. KayesE. Joseph NemanickNathan S. Lewis

Year: 2004 Journal:   Nano Letters Vol: 4 (5)Pages: 767-770   Publisher: American Chemical Society

Abstract

Porous alumina films with controllable pore sizes and having submicrometer film thicknesses were fabricated by the anodization of Al overlayers. The Al was deposited by sputtering onto either glass or onto silicon that had been coated with a layer of silicon nitride. Alumina membranes having thicknesses between 300 and 1000 nm were prepared analogously using a lithographic process to produce free-standing porous alumina films that were peripherally supported on a 500-μm-thick silicon substrate.

Keywords:
Materials science Silicon nitride Silicon Fabrication Anodizing Substrate (aquarium) Membrane Sputtering Nanoscopic scale Nanotechnology Porous silicon Porosity Layer (electronics) Nitride Thin film Composite material Aluminium Optoelectronics Chemistry

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18
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0.90
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Citation History

Topics

Anodic Oxide Films and Nanostructures
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced ceramic materials synthesis
Physical Sciences →  Materials Science →  Ceramics and Composites
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