Chee-Seng TohBrendan M. KayesE. Joseph NemanickNathan S. Lewis
Porous alumina films with controllable pore sizes and having submicrometer film thicknesses were fabricated by the anodization of Al overlayers. The Al was deposited by sputtering onto either glass or onto silicon that had been coated with a layer of silicon nitride. Alumina membranes having thicknesses between 300 and 1000 nm were prepared analogously using a lithographic process to produce free-standing porous alumina films that were peripherally supported on a 500-μm-thick silicon substrate.
Guqiao DingMaojun ZhengWeilin XuWei Shen
Shi Yang WangGuohao YuJixian GongQ T LiHao XuDavid Z. ZhuZhiwei Zhu
M. C. SalvadoriM. CattaniVictor P. MammanaO.R. MonteiroJoel W. AgerI.G. Brown
Hyeon‐Jin ShinIn‐Sung ParkYong Ju JangSeong Ju WiGi Sung LeeJinho Ahn
Guoliang DingMaojun ZhengWeilin XuWenzhong Shen