&lt;title&gt;Exposure schedule for multiplexing holograms in photopolymer&lt;/title&gt;

Shiuan‐Huei Lin; Ken Y. Hsu; Wei-Zheng Chen; Wha-Tzong Whang

doi:10.1117/12.363923

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<title>Exposure schedule for multiplexing holograms in photopolymer</title>

Shiuan‐Huei Lin Ken Y. Hsu Wei-Zheng Chen Wha-Tzong Whang

Year: 1999 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Publisher: SPIE

DOI: 10.1117/12.363923

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Abstract

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photo-polymer materials with similar kinetics.

Keywords:

Holography Multiplexing Photopolymer Schedule Holographic data storage Polymer Materials science Grating Methacrylate Methyl methacrylate Computer science Diffraction efficiency Optoelectronics Doping Optics Polymerization Telecommunications Physics Composite material

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Photorefractive and Nonlinear Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Fiber Laser Technologies

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

<title>Exposure schedule for multiplexing holograms in photopolymer</title>

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