JOURNAL ARTICLE

Atomic Layer Epitaxy of ZnSe-(CdSe)m(ZnSe)n Short-Period Superlattice Multiple Quantum Wells

Zhongling PengJie LiYAO WEN-HUAHe LiXingyu Cheng Xingyu ChengShinxi Yuan Shinxi Yuan

Year: 1992 Journal:   Japanese Journal of Applied Physics Vol: 31 (11B)Pages: L1583-L1583   Publisher: Institute of Physics

Abstract

Atomic-layer epitaxy growth of ZnSe-(CdSe) m (ZnSe) n short-period superlattice multiple quantum wells (SPSQWs) has been investigated. High crystalline quality has been achieved in this system by the introduction of an ultra-short-period (CdSe) m (ZnSe) n superlattice in the well to replace a ZnCdSe alloy, due to the success in solving problems associated with mismatch dislocations and alloying. Material characterizations have been performed by X-ray diffraction and photoluminescence. The critical thickness of CdSe on ZnSe has been determined to be less than four monolayers.

Keywords:
Superlattice Photoluminescence Atomic layer epitaxy Period (music) Monolayer Materials science Layer (electronics) Epitaxy Quantum well Diffraction Optoelectronics Molecular beam epitaxy Alloy Condensed matter physics Optics Nanotechnology Physics Metallurgy

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